Handbook of Chemical Vapor Deposition : Principles, Technology and Applications
Handbook of Chemical Vapor Deposition : Principles, Technology and Applications
Click to enlarge
Author(s): Pierson, Hugh O.
ISBN No.: 9780815514329
Pages: 506
Year: 199909
Format: Trade Cloth (Hard Cover)
Price: $ 338.10
Dispatch delay: Dispatched between 7 to 15 days
Status: Available

Introduction and General Considerations Fundamentals of Chemical Vapor Deposition The Chemistry of CVD Metallo-Organic CVD (MOCVD) CVD Processes and Equipment The CVD of Metals The CVD of the Allotropes of Carbon The CVD of Non-Metallic Elements The CVD of Ceramic Materials: Carbides The CVD of Ceramic Materials: Nitrides The CVD of Ceramic Materials: Oxides The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) CVD in Electronic Applications: Semiconductors CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers CVD in Optoelectronic and Ferroelectric Applications CVD in Optical Applications CVD in Wear- and Corrosion-Resistant Applications CVD in Cutting-Tool Applications CVD in Fiber, Powder, and Monolithic Applications Conversion Guide Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification Index.


To be able to view the table of contents for this publication then please subscribe by clicking the button below...
To be able to view the full description for this publication then please subscribe by clicking the button below...